Acmewin International Corp. announced a front-end-of-line process verification milestone for the Aibo II Dry Asher following long-term technical collaboration with a semiconductor research partner.
The work reviewed plasma photoresist stripping on selected wafer structures and process conditions.
The milestone supports continued engineering evaluation of the Aibo II platform for semiconductor process applications. Results remain dependent on wafer structure, material stack, equipment configuration and recipe validation.
Acmewin will continue product and process development through controlled technical collaboration and project-specific review.